Job description

Background Information The latest generation of lithography machines uses light in the extreme ultra violet range. Since light of this wavelength (13.5 nm) is absorbed by any optical medium, reflective optics in a vacuum are used. Any dust particle can potentially ruin the light patterns that are generated in the machines. Therefore, high velocity jets of low pressure gas are used to push contamination away from sensitive modules. But at the same time the pressure needs to be as low as possible allow for maximal EUV transmission. This leads to a slip-flow condition in the rarified gas regime: the gas…

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